Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
We consider an APX-hard variant (Δ-Max-ATSP) and an APX-hard relaxation (Max-3-DCC) of the classical traveling salesman problem. We present a frac(31, 40)-approximation algorithm for Δ-Max-ATSP and a frac(3, 4)-approximation algorithm for Max-3-DCC with polynomial running time. The results are obtained via a new way of applying techniques for computing undirected cycle covers to directed problems. © 2009 Elsevier B.V. All rights reserved.
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Yixiong Chen, Weichuan Fang
Engineering Analysis with Boundary Elements
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.