Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
It has been demonstrated that atomic force microscopy imaging with CO-functionalized tips provides unprecedented resolution, yet it is subject to strong image distortions. Here we propose a method to correct for these distortions. The lateral force acting on the tip apex is calculated from three-dimensional maps of the frequency shift signal. Assuming a linear relationship between lateral distortion and force, atomic force microscopy images could be deskewed for different substrate systems. © 2014 American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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EMC 2011
A. Krol, C.J. Sher, et al.
Surface Science
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JES