G. Shahidi, B. Davari, et al.
IEDM 1990
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors.
G. Shahidi, B. Davari, et al.
IEDM 1990
T.H. Ning, C.M. Osburn, et al.
Journal of Applied Physics
Bahman Hekmatshoar, T.H. Ning
Electronics Letters
T.H. Ning, C.M. Osburn, et al.
Journal of Electronic Materials