D.S. Wen, C.C.-H. Hsu, et al.
IEDM 1989
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors.
D.S. Wen, C.C.-H. Hsu, et al.
IEDM 1989
C.C.-H. Hsu, L.K. Wang, et al.
Journal of Electronic Materials
A. Hartstein, T.H. Ning, et al.
Surface Science
E. Ganin, T.C. Chen, et al.
IEDM 1990