G. Shahidi, B. Davari, et al.
IEDM 1990
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors.
G. Shahidi, B. Davari, et al.
IEDM 1990
P. Oldiges, R.H. Dennard, et al.
IEDM 2009
T.H. Ning, C.M. Osburn, et al.
Journal of Electronic Materials
C.C.-H. Hsu, L.K. Wang, et al.
IRPS 1989