Jayaram Krisinaswamy, Lumin Li, et al.
Proceedings of SPIE 1989
A few micron wide and thick polymer lines are formed from a monomer, methacrylic anhydride, according to a metal pattern of a mask under high-energy radiation, such as γ rays. The resolution is limited only by the mask configuration; with our present mask configuration it is better than ∼2000 Å. The polymerization is initiated by electrons ejected from metal lines.
Jayaram Krisinaswamy, Lumin Li, et al.
Proceedings of SPIE 1989
Hiroyuki Hiraoka
J. Photopolym. Sci. Tech.
Hiroyuki Hiraoka, Adolfo R. Gutierrez
JES
Hiroyuki Hiraoka
Microelectronic Engineering