Joseph M. Jasinski
Chemical Physics Letters
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski
Chemical Physics Letters
Joseph M. Jasinski
Chemical Physics Letters
Joseph M. Jasinski, Joan K. Frisoli, et al.
The Journal of Chemical Physics
Christopher R. Moylan, John I. Brauman, et al.
JACS