Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode

Abstract

The fabrication of magnetic elements containing constrictions is demonstrated using nanostencil lithography in dynamic mode, i.e., by a continuous translation of a shadow mask with respect to the sample. The authors quantify the current resolution limits of this technique, demonstrating edge profile widths of 120 nm and thickness variations of 10%, and discuss prospects and challenges of dynamic nanostencil lithography. © 2007 American Institute of Physics.