Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Graphic design, layout, and the use of typography are among topics discussed in this essay about the collaboration between an art director at IBM and researchers at the Visible Language Workshop of the MIT Media Laboratory to produce printed journal cover designs. We highlight how a traditional graphic designer and computer programmers worked together to produce visual results on a computer display.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002
Yigal Hoffner, Simon Field, et al.
EDOC 2004