Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The use of floating-point calculations limits the accuracy of solutions obtained by standard LP software. We present a simplex-based algorithm that returns exact rational solutions, taking advantage of the speed of floating-point calculations and attempting to minimize the operations performed in rational arithmetic. Extensive computational results are presented. © 2007 Elsevier B.V. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Hannaneh Hajishirzi, Julia Hockenmaier, et al.
UAI 2011
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989