About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Paper
Evaluation of Onium Salt Cationic Photoinitiators as Novel Dissolution Inhibitor for Novolac Resin
Abstract
Triarylsulfonium and diaryliodonium salts are a new class of dissolution inhibitors for novolac resins. These radiochemical acid generators are soluble in common casting solvents and are thermally very stable. Simple triphenylsulfonium and diphenyliodonium salts sensitive to deep UV inhibit the dissolution of novolac resins in aqueous base very efficiently and render the exposed areas more soluble in aqueous base, providing full development at 25 mJ/cm2of 254 nm radiation. © 1988, The Electrochemical Society, Inc. All rights reserved.