Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985