Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We present a rendering of some common grammatical formalisms in terms of evolving algebras. Though our main concern in this paper is on constraint-based formalisms, we also discuss the more basic case of context-free grammars. Our aim throughout is to highlight the use of evolving algebras as a specification tool to obtain grammar formalisms. © 1995 Kluwer Academic Publishers.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
Inbal Ronen, Elad Shahar, et al.
SIGIR 2009
Daniel M. Bikel, Vittorio Castelli
ACL 2008