Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A unified approach to the formal description and validation of several distributed protocols is presented. After introducing two basic protocols, a series of known and new protocols for connectivity test, shortest path, and path updating are described and validated. All protocols are extended to networks with changing topology. © 1983 IEEE
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Robert G. Farrell, Catalina M. Danis, et al.
RecSys 2012
Erich P. Stuntebeck, John S. Davis II, et al.
HotMobile 2008
Elliot Linzer, M. Vetterli
Computing