Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Chemical proofreading systems, of the kind believed responsible for the extremely high fidelity of DNA replication, achieve minimum error probability (equal to the product of the error probabilities of the writing and proofreading stages) only in the limit of infinite energy dissipation. However, a considerable degree of proof-reading can be obtained in less strongly driven systems, dissipation only 0.1-1 kT/step. © 1979.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Matthew A Grayson
Journal of Complexity
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998