Conference paper
Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
No abstract available.
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002
Sankar Basu
Journal of the Franklin Institute
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007