Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
PaperPrioritizing a portfolio of information technology investment projectsIndranil R. Bardhan, Sugato Bagchi, et al.JMIS
Conference paperCombining lexical, syntactic, and semantic features with maximum entropy models for extracting relationsNanda KambhatlaACL 2004
PaperDistributed Code Assignments for CDMA Packet Radio NetworksLimin HuIEEE/ACM Transactions on Networking
