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Publication
Applied Physics Letters
Paper
Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate
Abstract
We have studied the chemical vapor deposition of copper from 1,5-cyclooctadiene Cu(I) hexafluoroacetylacetonate, a moderately volatile yellow cystalline solid. It yields pure copper by pyrolytic decomposition at 150-250 °C, produces copper films with near bulk resistivity, and has the advantage of being air stable at room temperature.