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Publication
Journal of Applied Physics
Paper
Chemical and electrical properties of interfaces between deposited insulators and La2CuO4
Abstract
Metal-insulator-semiconductor capacitors have been fabricated using plasma enhanced chemical vapor deposition of Si3N4 and SiO 2 insulators on La2CuO4 semiconducting single crystals. Auger electron spectroscopy was used to characterize the insulator-semiconductor interface after annealing at several temperatures. Copper segregation and oxygen out-diffusion were observed and the Si 3N4-semiconductor interface was found to be more stable than the SiO2-semiconductor one.