Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The chemical amplification concept was invented at IBM Research and quickly brought into use in the production of dynamic random access memory devices in the company. It has remained as an important foundation for the design of advanced resist systems for use in short-wavelength (<300-nm) lithographic technologies.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Gal Badishi, Idit Keidar, et al.
IEEE TDSC
Anupam Gupta, Viswanath Nagarajan, et al.
Operations Research
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009