Characterization of FeMn(N)/FeMn/Permalloy exchange coupled structures

Abstract

X-ray diffraction was used to investigate the effect of nitrogen additions on the crystal structure and preferred orientation of FeMn films reactively sputtered in an Ar-N2 ambient. The fcc γ-FeMn phase was stabilized over a range of nitrogen pressures. The fcc FeMn(N) film was then used as a nucleation substrate for the deposition of an FeMn/Permalloy exchange coupled structure. A maximum exchange bias of 60-70 Oe was obtained when the FeMn(N) film was lattice matched to the γ-FeMn structure (a 0=3.63 Å).