Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
TalkEnhanced Room Temperature Photoluminescence Quantum Yield in Morphology-Controlled J-AggregatesSurendra B. Anantharaman, Joachim Kohlbrecher, et al.MRS Fall Meeting 2020
PaperThermally Developable, Positive Resist Systems with High SensitivityHiroshi Ito, Reinhold SchwalmJES