Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
In this paper we consider a special kind of binary trees where each right edge is associated with a positive number α and each left edge with a positive number β(α ≦ β). Given α, β and the number of nodes n, an optimal tree is one which minimizes the total weighted path length. An algorithm for constructing an optimal tree for given α, β, n is presented, based on which bounds for balances and total weighted path lengths of optimal trees are derived. © 1977 BIT Foundations.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Heng Cao, Haifeng Xi, et al.
WSC 2003
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011