Ronald Troutman
Synthetic Metals
Recent progress in continuing CMOS scaling is accomplished by introducing new device structures and new materials. This paper reviews recent progress in new technology features for silicon CMOS. With the imminent perceived "end" of CMOS device scaling, there is renewed interest in other non-silicon-FET based device and system architectures. We will discuss the merits of various proposed devices and fabrication techniques and suggest areas for further study. © 2005 Published by Elsevier Ltd.
Ronald Troutman
Synthetic Metals
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
Ellen J. Yoffa, David Adler
Physical Review B
R.J. Gambino, N.R. Stemple, et al.
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