Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Recent progress in continuing CMOS scaling is accomplished by introducing new device structures and new materials. This paper reviews recent progress in new technology features for silicon CMOS. With the imminent perceived "end" of CMOS device scaling, there is renewed interest in other non-silicon-FET based device and system architectures. We will discuss the merits of various proposed devices and fabrication techniques and suggest areas for further study. © 2005 Published by Elsevier Ltd.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
Michiel Sprik
Journal of Physics Condensed Matter