Publication
Journal of Applied Physics
Paper

Barrier composition and electrical properties of high-quality all-niobium Josephson tunnel junctions

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Abstract

A fabrication procedure for all-niobium tunnel junctions with oxide tunnel barriers is described. All steps of the tunnel-barrier growth have been characterized in situ with the help of x-ray photoelectron spectroscopy. The chemical composition of the barrier is described, and the properties of devices discussed. The results demonstrate the application potential of these all-refractory junctions.

Date

01 Dec 1983

Publication

Journal of Applied Physics

Authors

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