About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Physical Review B
Paper
Anomalous coverage dependence of secondary-ion emission from overlayers
Abstract
We have observed an anomalous coverage dependence of sputtered Cs+ and Li+ yields from Cs and Li overlayers on Si(111) surfaces. The ion yield reaches a maximum and decreases at higher coverages even when the coverage is still less than a monolayer. We found that this phenomenon is directly related to the effect of the work function on the ionization probability. © 1984 The American Physical Society.