PublicationBritish Journal of Applied PhysicsPaperAnnealing of residual stress in silicon monoxide films [1]British Journal of Applied PhysicsView publicationAbstractNo abstract available.Home↳ PublicationsDate20 Nov 2002PublicationBritish Journal of Applied PhysicsAuthorsJ.R. PriestH.L. CaswellIBM-affiliated at time of publicationShare
