Publication
Journal of Applied Physics
Paper

Annealing behavior of amorphous ferromagnetic Co-Fe-B and Fe-B thin films

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Abstract

The annealing behavior of amorphous Co-Fe-B and Fe-B thin films, fabricated by rf sputtering in an argon plasma, have been investigated. The magnetostrictive Fe-B films exhibit a perpendicular anisotropy in the as-deposited condition, but after a stress relief anneal an in-plane anisotropy is obtained. An in-plane easy axis develops in the as-deposited Co-Fe-B thin films. The in-plane anisotropy direction in both sets of films can be rotated by annealing in an external magnetic field aligned parallel to the hard axis via a thermally activated process. Preannealing with a magnetic field aligned parallel to the easy axis stabilizes these films to a significant extent. The kinetics of easy axis rotation has a simple logarithmic dependence on time. Analysis of the kinetics of easy axis rotation indicates that preannealing apparently increases the thermal activation energy for this rotation process.

Date

01 Dec 1981

Publication

Journal of Applied Physics

Authors

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