Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Consider the method of independent replications with initial transient deletion for generating confidence intervals for 'steady-state' quantities. To produce intervals with good convergence characteristics, the relative growth rates of the number of replications, the length of each replication, and the deletion period must be controlled. Critical rates for these parameters are determined. The applicability of these results to simultaneously running multiple replications on a highly parallel computer is discussed. © 1991.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings