Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A simple algorithm which uses an indexed temporary table to perform reduction of operator strength in strongly connected regions is presented. Several extensions, including linear function test replacement, are discussed. These algorithms should fit well into an integrated package of local optimization algorithms. © 1977, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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Journal of Global Optimization
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