Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
No abstract available.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
Lawrence Suchow, Norman R. Stemple
JES