Michiel Sprik
Journal of Physics Condensed Matter
The effects of both ׳-aminopropyltriethoxysilane (APS) and elevated temperature and humidity (T&H) exposure on the adhesion of pyromellitic dianhydride-oxydianiline polyimide to SiO, ΑΙ,Ο, and MgO were studied using XPS, SEM, and pee! test. Adhesion and T&H stability of PMDA-ODA on SiO, is significantly improved when APS is used at the interface, while no significant improvement is observed for A120, or MgO. XPS analysis of the surfaces showed no retention of APS on ΑΙ,Ο, or MgO, while Si02 did retain APS, as is expected. The APS retention is affected by surface treatment of the oxide prior to APS application. © 1991, VSP. All rights reserved.
Michiel Sprik
Journal of Physics Condensed Matter
Mark W. Dowley
Solid State Communications
J.A. Barker, D. Henderson, et al.
Molecular Physics
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011