Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In secondary neutral mass spectrometry (SNMS) depth profiling the variation of time-dependent sputter removal rate can be evaluated from the sum of all SNMS signals. Hence, besides the quantitative sample composition the absolute depth scale can be determined if the particle density in the sample is known. Examples for such a complete analysis with respect to composition and depth are presented for NiCr multilayer systems with an individual layer thickness around 15 nm. © 1989.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
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Journal of Polymer Science Part A: Polymer Chemistry