Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A weakest precondition semantics for communicating processes is presented, based on a centralized, one-level approach. Semantic equations are given for the CSP constructs and their continuity is proved. The equivalence of two weakest precondition definitions, one with certain order preferences, and another one, preference-free, is shown. The representation of various operational concepts, including delay, is discussed. Several examples of applying the rules are given. © 1984.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Preeti Malakar, Thomas George, et al.
SC 2012
Xinyi Su, Guangyu He, et al.
Dianli Xitong Zidonghua/Automation of Electric Power Systems
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004