Bruno Schuler, Wei Liu, et al.
Physical Review Letters
We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K. © 2014 AIP Publishing LLC.
Bruno Schuler, Wei Liu, et al.
Physical Review Letters
Leo Gross
Nature Chemistry
Jascha Repp, Wolfram Steurer, et al.
Physical Review Letters
Diego Peña, Leo Gross
Nat. Synth.