Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
An important recent development in the area of solution of general sparse systems of linear equations has been the introduction of new algorithms that allow complete decoupling of symbolic and numerical phases of sparse Gaussian elimination with partial pivoting. This enables efficient solution of a series of sparse systems with the same nonzero pattern but different coefficient values, which is a fairly common situation in practical applications. This paper reports on a shared- and distributed-memory parallel general sparse solver based on these new symbolic and unsymmetric-pattern multifrontal algorithms. © 2007 Springer-Verlag.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Imran Nasim, Melanie Weber
SCML 2024
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering