About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Physica Scripta
Paper
A scanning photoelectron microscope (SPEM) at the NSLS
Abstract
We are in the process of developing and commissioning a scanning photoelectron microscopy (SPEM) at the X1A beamline of the National Synchrotron Light Source (NSLS). It is desigend to make use of the Soft X-ray Undulator (SXU) at the NSLS. This high brightness source illuminates a Fresnel zone plate, which forms a focused probe, leq;;0.2 µm in size, on the specimen surface. A grating monochromator selects the photon energy in the 400-800 eV range with an energy resolution of better than 1 eV. The expected flux in the focus is in the 5 × 107-109 photons/s range. A single pass Cylindrical Mirror Analyzer (CMA) is used to record photoemission spectra, or to form an image within a fixed electron energy bandwidth as the specimen is mechanically scanned. As a first test, a 1000 mesh Au grid was successfully imaged with a resolution of about 1 µm and the CMA tuned to the Au 4f photoelectron peak. Once it is commissioned, a program is planned which will utilize the microscope to study beam sensitive systems, such as thin oxide/sub-oxide films of alumina and silica, and ultimately various adsorbates on these films. © 1990 IOP Publishing Ltd.