Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
M.F. Cowlishaw
IBM Systems Journal
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Khalid Abdulla, Andrew Wirth, et al.
ICIAfS 2014