Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We characterize the sofic systems which have minimal subshift-of-fimtetype covers and derive some consequences. © 1985 American Mathematical Society.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences
James Lee Hafner
Journal of Number Theory
Shu Tezuka
WSC 1991