Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We develop a multilevel method suitable for solving operator equations. This method combines the multiresolution structure of the spaces used to solve the operator equation with a Gauss-Seidel strategy to solve the associated matrix equations. We prove that this multilevel scheme has an optimal order of convergence and provide an application of it to the solution of second kind integral equations. © 2001 Academic Press.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering
Charles A Micchelli
Journal of Approximation Theory