Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper presents a model of an I/O subsystem in which devices can be accessed from multiple CPUs and/or via alternative channel and control unit paths. The model estimates access response times, given access rates for all CPU-device combinations. Central to the model's algorithm is the estimation of the rotational position sensing (RPS) miss probabilities by means of the maximum entropy principle. © 1980, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Robert G. Farrell, Catalina M. Danis, et al.
RecSys 2012
Leo Liberti, James Ostrowski
Journal of Global Optimization
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev