J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
A procedure for the vapor deposition of a thick layer of silicon oxide was developed to confine thin polymer films between two rigid flat walls. For silicon oxide overlayers thicker than ∼ 1.5 μm the deposited silicon oxide layer is mechanically stable against heating above the glass transition temperature of the polymer. Neutron reflectivity measurements show that the interface between the polymer and the deposited silicon oxide is sharp, having a characteristic width of 1.5 nm. © 1994.
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry