Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present a linear-time algorithm that finds all edges and vertices in the intersection of all odd cycles in a given graph. We also show an application of our algorithm to a variant of the satisfiability problem of Boolean formulas.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.