Arun Viswanathan, Nancy Feldman, et al.
IEEE Communications Magazine
No abstract available.
Arun Viswanathan, Nancy Feldman, et al.
IEEE Communications Magazine
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM
Robert E. Donovan
INTERSPEECH - Eurospeech 2001