PaperInterface kinetics and crystal growth under conditions of constant cooling rate. I. Constant diffusion coefficientR. Ghez, J.S. LewJournal of Crystal Growth
PaperLight-coupling masks: An alternative, lensless approach to high-resolution optical contact lithographyHeinz Schmid, Hans Biebuyck, et al.Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
PaperSoft x-ray investigation of the effect of growth conditions on InAs/GaAs heterostructuresA. Krol, C.J. Sher, et al.Surface Science
