Residual stress and lattice distortion mapping of patterned devices which failed electromigration testing using the microbeam X-ray diffraction (MXRD) technique
- B.R. York
- H.L. Pfizenmayer
- et al.
- 1996
- MRS Spring Meeting 1996
Publications
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- Materials Discovery
3430 results for Materials Discovery
Dependence of crystallographic texture of C54 TiSi2 on thickness and linewidth in submicron CMOS structures
- V. Svilan
- K.P. Rodbell
- et al.
- 1996
- MRS Spring Meeting 1996
Copper migration and precipitate dissolution in aluminum/copper lines during electromigration testing
- T.M. Shaw
- C.-K. Hu
- et al.
- 1996
- MRS Spring Meeting 1996
UV laser deposition of thin films at 248 NM for phase shifting mask repair
- Janos Farkas
- P.B. Comita
- et al.
- 1994
- MRS Fall Meeting 1994
Directional sputter deposition for semiconductor applications
- S.M. Rossnagel
- 1994
- MRS Fall Meeting 1994
Solvent, LiCl, and temperature effects on the morphological structure and electronic properties of polyaniline
- Marie Angelopoulos
- Yun-Hsin Liao
- et al.
- 1995
- MRS Fall Meeting 1995
Light scattering measurement of surface topography during formation of titanium silicide
- C. Lavoie
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
Synthesis of oligomeric p-phenyleneimine by self-condensation reaction of a novel monomer
- A. Afzali
- J. Gelorme
- 1995
- MRS Fall Meeting 1995
Theoretical considerations about phase growth and phase formation
- F.M. D'Heurle
- 1995
- MRS Fall Meeting 1995
In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995