Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- - Sebastian U. Engelmann
  - Qinghuang Lin
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
- - Dario Goldfarb
  - William Broadbent
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- - Dario Goldfarb
  - Max O. Bloomfield
  - et al.
- 2016
- SPIE Advanced Lithography 2016
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- - R. Muthinti
  - Nicolas Loubet
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Assessments of image-based and scatterometry-based overlay targets
- - Chiew-Seng Koay
  - Nelson Felix
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Acid generation efficiency: EUV photons versus photoelectrons
- - Dario Goldfarb
  - Ali Afzali-Ardakani
  - et al.
- 2016
- SPIE Advanced Lithography 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2016
- SPIE Advanced Lithography 2016
PVD prepared molecular glass resists for scanning probe lithography
- - Christian Neuber
  - Hans-Werner Schmidt
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Contrast enhanced diffusion NMR: Quantifying impurities in block copolymers for DSA
- - Rudy J. Wojtecki
  - Ellie Porath
  - et al.
- 2016
- SPIE Advanced Lithography 2016