Ultimate 2D resolution printing with negative tone development
- Martin Burkhardt
- Yongan Xu
- et al.
- 2016
- SPIE Advanced Lithography 2016
Publications
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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Year
DSA via hole shrink for advanced node applications
- Cheng Chi
- Chi Chun Liu
- et al.
- 2016
- SPIE Advanced Lithography 2016
Evaluation of ALE processes for patterning
- J. M. Papalia
- Nathan Marchack
- et al.
- 2016
- SPIE Advanced Lithography 2016
Modeling and parameter tuning for templated directed self-Assembly
- Balint Meliorisz
- T. Mülders
- et al.
- 2016
- SPIE Advanced Lithography 2016
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- Kristin Schmidt
- Hitoshi Osaki
- et al.
- 2016
- SPIE Advanced Lithography 2016
DSA patterning options for FinFET formation at 7nm node
- Chi Chun Liu
- Elliott Franke
- et al.
- 2016
- SPIE Advanced Lithography 2016
Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- S. U. Engelmann
- Qinghuang Lin
- et al.
- 2016
- SPIE Advanced Lithography 2016
Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
- Dario Goldfarb
- William Broadbent
- et al.
- 2016
- SPIE Advanced Lithography 2016
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- Dario Goldfarb
- Max O. Bloomfield
- et al.
- 2016
- SPIE Advanced Lithography 2016
EUV patterning successes and frontiers
- Nelson Felix
- Daniel Corliss
- et al.
- 2016
- SPIE Advanced Lithography 2016