Receptivity of an AI cognitive assistant by the radiology community: A report on data collected at RSNA
- 2020
- BIOSTEC 2020
Publications
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- 2020
- SPIE Advanced Lithography 2020
EUVL mask process development and verification using advanced modeling and characterization techniques
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- 2020
- SPIE Advanced Lithography 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- 2020
- SPIE Advanced Lithography 2020
Oak: A scalable off-heap allocated key-value map
- 2020
- PPoPP 2020