Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

51 results for Nelson Felix

DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- - Kristin Schmidt
  - Hitoshi Osaki
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA patterning options for FinFET formation at 7nm node
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
- - Dario Goldfarb
  - William Broadbent
  - et al.
- 2016
- SPIE Advanced Lithography 2016
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- - R. Muthinti
  - Nicolas Loubet
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Assessments of image-based and scatterometry-based overlay targets
- - Chiew-Seng Koay
  - Nelson Felix
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- - Chi Chun Liu
  - Fee Li Lie
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Scatterometry-based defect detection for DSA in-line process control
- - Robin Chao
  - Chi Chun Liu
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Review of nanosheet metrology opportunities for technology readiness
- - Mary A. Breton
  - Daniel Schmidt
  - et al.
- 2022
- JM3